Area for chemical methods

This area is designed for characterisation and nanostructuring of surfaces and particles. It holds cleanroom class ISO 7 (10 000) and is equipped for the following processes:

Nanosynthesis:

• Wet chemical methods (dip / spin coaters, microwave oven)
• Hydrothermal synthesis (high temperature ovens, autoclaves)
• Nanoparticle / structure separation (sentrifuges, ultrasound)
• Nanoimprinting
• CVD (chemical vapour deposition)

Nanoscale characterisation:

• AFM (Atomic Force Microscope ) morphological / elekcrochemical
• SECM (Scanning Electrochemical Microscope)
• PSA (Particle size analysis)

Additional facilities:

• Personal work places (benches, hoods, LAF benches)
• Access to glove boxes (N2, Ar) og Schlenk lines
• General laboratory equipment
• Chemicals: Standard bulk chemicals are offered. Specialised chemicals / consumables must be covered by the user.