Cleanroom area for synthesis and structuring by physical methods
This area is equipped for thin film growth, micro- and nanolithographic methods and various etching processes. The area holds cleanness ranging from ISO7 (10 000) to ISO 5 (100) and is build according to the requirements of GMO II, laboratory class 2.
The area is equipped for the following types of activities:
- Ultraviolet photolithography
- Electronbeam lithography
- Nanoimprinting / nanoprinting
- Metal-deposition by recessiv heating / ionsputtering /elekcronbeam heating
- Deposition of dielectrica
- Etching by wet chemical
- Etching by ion-etching
Specialised equippment:
- En mønstertilpassere for fotolitografi.
- Et sveipelektronmikroskop for elektronstrålelitografi med laser stage for "stitching" (arbeid over stor areal)
- En mønstertilpassere for nanoimprinting /nanoprinting.
- A general plasmaetch (Ar/O/F)
- Plasma etch for chlorine based etching (ICP-RIE)
- PECVD (Plasma enhanced chemical vapour deposition)
- Equipment for HF-etching (Spin-etching)
- Profilometer
