FE8135 - Nanostructuring

About

New from the academic year 2012/2013

Examination arrangement

Examination arrangement: Written examination
Grade: Passed/Failed

Evaluation form Weighting Duration Examination aids Grade deviation
Skriftlig eksamen 100/100 4 timer

Course content

The course consists of three modules, which covers important techniques for nanostructuring of solids. The course modules are electron beam lithography (EBL), nanoimprint, and focused ion beam (FIB) lithography.

The EBL-module includes processing of defined structures in metal layers by electron beam evaporation and etching processes. Issues regarding dosage, optimization and limitation in the pattern generation will also be discussed.

The nanoimprint module will provide an overview of the most important implementations of nanoimprint lithography, with emphasis on photo nanoimprint lithography (P-NIL). Issues regarding template/mold fabrication, wafer-scale imprint, benefits, limitations, and concerns with this technique for structuring on the sub-100 nm length scale will be discussed.

The FIB-module will discuss the principles of this instrument, used as a tool for precision milling, deposition, and imaging of nanoscale structures in solids. Benefits and concerns with this technique, as well as different applications ranging from preparation of samples for transmission electron microscopy (TEM) to 3D characterization and corrective measures on integrated circuits (ICs) will be discussed.

Learning outcome

Knowledge: The course aims to provide knowledge on electron beam lithography (EBL), nanoimprint and focused ion beam (FIB) lithography.

Skills: The course will provide training on listed techniques in the cleanroom.

Learning methods and activities

Lectures, self-study and laboratory exercises. This course is part of the course portfolio supported by the Norwegian PhD Network in Nanotechnology for Microsystems (www.nano-network.net ), and will be taught in three seminars, each of one week duration. The EBL-module will be given at the University of Bergen, Department of physics and technology, by Professor Bodil Holst, while the nanoimprint and FIB modules will be taught at NTNU, with Professor Jostein Grepstad and Associate Professor Antonius T. J. van Helvoort as the respective lecturers. The cleanroom at NTNU NanoLab will be used for laboratory training in the nanoimprint and FIB modules.

Maximum number of students is 8 . Students enrolled in the “Norwegian PhD Network on Nanotechnology for Microsystems” and for whom this course is part of their PhD course plan, will be given priority.

Compulsory assignments

  • Laboratory report

Specific conditions

Exam registration requires that class registration is approved in the same semester. Compulsory activities from previous semester may be approved by the department.

Course materials

Given at course start

Examination

Examination arrangement: Written examination

Term Statuskode Evaluation form Weighting Examination aids Date Time Room *
Autumn ORD Skriftlig eksamen 100/100 2012-12-04 09:00
Spring ORD Skriftlig eksamen 100/100
  • * The location (room) for a written examination is published 3 days before examination date.
If more than one room is listed, you will find your room at Studentweb.