Course content

Processing of semiconductor devices and CMOS integrated circuits, including film deposition, ion implant, photolithography, etch, metallization, assembly and packaging. In addition, epitaxial growth of semiconductors. Compound semiconductor heterostructures and superlattices. The assessment of semiconductors by electrical techniques (resistivity, mobility, doping levels), by ion beam techniques (SIMS), and by microscopy and imaging (optical, SEM, TEM, STM, AFM).

Learning outcome

Introduction to semiconductor thin film technology for fabrication of electronic and photonic devices and CMOS integrated circuits.

A. Knowledge:
This course shall provide the theoretical basis for doing photolithography and processing of semiconductor devices and CMOS integrated circuits, as well as the theoretical basis for selected characterization techniques.

B. Skills:
Be able to do photolithography and simple processing of semiconductors in clean room, and to do characterization with selected techniques. Be able to present and discuss the theoretical basis for processing and characterization.

Learning methods and activities

Lectures, excercises, presentations by the students, laboratory demonstrations, and laboratory excercises in clean room. If there is a re-sit examination, the examination form may be changed from written to oral.

Compulsory assignments

• Presentation
• Laboratory exercises
• Problem solving exercises

Recommended previous knowledge

Basic knowledge of physics and mathematics at university level. Basic knowledge of chemistry from high school.

Course materials

To be announced at start-up.

Credit reductions