course-details-portlet

TMT4300

Light and Electron Microscopy

Credits 7.5
Level Second degree level
Course start Spring 2011
Duration 1 semester
Language of instruction English
Examination arrangement Written examination

About

About the course

Course content

Construction, manner of operation, and application of the microscopes. Light microscopy: Contrast, resolution, illumination modes, polarized light, interference microscopy, interference layer, fluorescence. Scanning electron microscopy: electron optics, interaction electron beam - specimen (secondary electrons, backscattered electrons, X-rays), micro analyses, imaging (detectors, contrast mechanisms), diffraction, fractography, low-vacuum SEM, field emission SEM. transmission electron microscopy: Diffraction, brightfield, darkfield.

Learning outcome

The course teaches the students to use the light microscope (LM), the scanning electron microscope (SEM), and the transmission electron microscope (TEM). For LM and SEM the students should obtain a profound understanding of the theory behind the microscopes, how they are constructed, how they work and how they are used. Concerning TEM, the course gives a simple theoretical introduction based on Bragg's law and a simple introduction in construction and use. Only to a limited extent the course deals with specimen preparation. The course should give the students the necessary skills to carry out the most common microscopy investigations, in the first instance within their project and master projects. In addition, the course also serves as a qualification course for the PhD course Electron microscopy.
Within light microscopy the students should be able to explain the theory for image formation, contrast, resolution, polarized light applied on metals, interference microscopy, interference films and fluorescence, and they should be able to explain the manner and mode of operation of accessories like diaphragms, filters, prisms, stoppers and objective lenses. In addition, the students should be able to carry out estimates of resolving power and height differences in the specimen surface (interference microscopy). The students should also know different methods for measuring grain and particle sizes directly in the microscope.
Within SEM the students should be able to explain the theories for electron optics, the interactions between electron beam and specimen (secondary and backscattered electrons, X-ray formation), microanalysis (EDS and WDS), image formation (detectors, contrast mechanisms), diffraction (EBSD), fractography, as well as different types of SEM microscopes. Furtermore, the students should be able to carry out calculations associated with resolution power, depth of view, atomic number contrast, and element number (Moseleys law). Through practical laboratory work the students should also be able to operate the microscopes and to do necessary adjustments to obtain optimum conditions for imaging, diffraction studies and chemical analysis, i.e. adjustment of acceleration voltage, beam current, working distance, astigmatism and objective aperture.
Within TEM the students should be able to explain the most common imaging techniques bright field, dark field, lattice imaging and diffraction. From Bragg's law they should be able to explain how diffraction patterns are formed in the microscope and how diffraction contrast is obtained in bright field and dark field images. Of common adjustments, it is expected that the students should be able to adjust the specimen height and the condensor aperture (in addition to focus). From diffraction patterns, the students should be able to calculate atomic plane distances of phases that are contained within the specimen.
Through laboratory work and report writing the students should develop their skills in collaboration and written communication of scientific results.

Learning methods and activities

Lectures and mandatory tutorials and laboratory exercises. Instruction is provided in English or Norvegian as needed. If there is a re-sit examination, the examination form may change from written to oral.

Compulsory assignments

  • Exercises

Course materials

J. K. Solberg og V. Hansen: Innføring i transmisjon elektronmikroskopi, compendium. J.K. Solberg: Lysmikroskopi, compendium. J. Hjelen: Scanning elektronmikroskopi, compendium.

Credit reductions

Course code Reduction From
SIK5077 7.5 sp
TMT4301 7.5 sp
This course has academic overlap with the courses in the table above. If you take overlapping courses, you will receive a credit reduction in the course where you have the lowest grade. If the grades are the same, the reduction will be applied to the course completed most recently.

Subject areas

  • Physical Metallurgy
  • Materials Science and Engineering
  • Technological subjects

Contact information

Course coordinator

Lecturers

Department with academic responsibility

Department of Materials Science and Engineering

Examination

Examination

Examination arrangement: Written examination
Grade: Letters

Ordinary examination - Spring 2011

Written examination
Weighting 100/100 Date 2011-05-20 Time 09:00 Duration 4 timer Place and room Not specified yet.