Course content

The course is given conditional upon a sufficient number of registered students and access to certified instructors and instrument time for the lab exercises in NTNU NanoLab.

The course consists of three modules covering important techniques for nanostructuring of solids/thin films. The course modules are electron beam lithography (EBL), nanoimprint lithography (NIL), and focused ion beam (FIB) processing.

The EBL module includes processing of defined structures in metal layers on quartz by electron beam evaporation and etching processes. Issues regarding dosage, optimization, and limitations in the pattern generation will be discussed.

The NIL module will provide an overview of the most important implementations of nanoimprint lithography, with emphasis on photo-nanoimprint lithography (UV-NIL). Issues regarding template/mold fabrication, waferscale imprint, benefits, limitations, and concerns with this technique for structuring on the sub-100nm length scale will be discussed.

The FIB module will discuss the principles of this instrument as a tool for precision milling, deposition, and imaging of nanoscale structures in solids/thin films. Benefits and concerns with this technique, and applications ranging from preparation of samples for transmission electron microscopy (TEM) to 3D characterization and corrective measures on integrated circuits (ICs) will be discussed.

Learning outcome

Knowledge: The course aims to provide knowledge on electron beam lithography (EBL), nanoimprint lithography (NIL), and focused ion beam (FIB) lithography.

Skills: The course will provide training on the listed techniques in a cleanroom environment.

Learning methods and activities

Lectures, independent studies, and laboratory exercises. This course is part of the course portfolio sponsored by the "Norwegian PhD Network in Nanotechnology for Microsystems" (www.nano-network.net). It is given as 2-3 seminars, each of one week duration. The EBL module will be given at the University of Bergen, Department of Physics and Technology, by professor Bodil Holst, while the NIL and FIB modules will be taught at NTNU, with professor Jostein Grepstad and professor Antonius T. J. van Helvoort as lecturers. The cleanroom at NTNU NanoLab will be used for laboratory training in the NIL and FIB modules.

Maximum number of students is 6. Students enrolled in the “Norwegian PhD Network on Nanotechnology for Microsystems” will be prioritized, with preference for those who have this course as part of their PhD course plan.

We ask that that PhD candidates who plan to follow this course sign up before 20. November in the preceeding semester, as the (2-3) seminars will take place in the period primo January to primo February.

Compulsory assignments

• Laboratory report

Recommended previous knowledge

Thin film/semiconductor technology, solid state physics/chemistry
scanning electron microscopy (SEM)

Course materials

Given at course start