TFE4167 - Micro- and nanofabrication


Examination arrangement

Examination arrangement: School exam
Grade: Letter grades

Evaluation Weighting Duration Grade deviation Examination aids
School exam 100/100 4 hours C

Course content

This course provides an introduction to micro- and nanofabrication, including silicon technology for fabrication of sensors and actuators. Selected semiconductor manufacturing processes in clean room, such as photolithography, etch and metallization are highlighted. Basic mechanics for design of microelectromechanical systems (MEMS) is presented, together with different principles for sensors and actuators based on piezoresistivity, electrostatics, capacitance and thermal effects. Design and fabrication of different physical sensors, such as pressure sensors and accelerometers, are given in detail.

Learning outcome

Knowledge: The candidate has: - detailed knowledge on selected topics within fabrication technology for semiconductor devices and integrated circuits, as well as the different fabrication processes for manufacturing of MEMS - knowledge on the basic properties and applications of microsystem technology - knowledge on the general characteristics of sensors and actuators - detailed knowledge on the functional principles and structure of various types of micro-electro-mechanical sensors and actuators - knowledge on the key aspects, trade-offs and basic principles of design and optimization of MEMS. Technical skills: The candidate can: - do photolithography and simple processing of semiconductors in clean room, and do characterization with selected techniques - propose suitable sensor or actuation principles to achieve a particular function - select the optimal sensor or actuator design - carry out simple calculations of electro-mechanical properties of micro-electro-mechanical components - propose a suitable process for the fabrication of specific micro-electro-mechanical components. General expertise: The candidate has: - the required knowledge for more advanced studies on the fabrication technology and principles of operation of advanced semiconductor devices, electronic circuits and systems. - the required knowledge to discuss micro system technology in the context of important trends within information technology.

Learning methods and activities

Auditorium lectures and exercises (problems), and laboratory excercises in clean room and characterization lab.

Compulsory assignments

  • Exercises
  • Lab exercises

Further on evaluation

The written exam will be given in English only. If there is a re-sit examination in August, the examination form may be changed from written to oral.

Course materials

To be announced at course start.

Credit reductions

Course code Reduction From To
TFE4180 3.7 AUTUMN 2018
TFE4177 3.7 AUTUMN 2018
TFE4225 3.7 AUTUMN 2018
TFE4162 3.7 AUTUMN 2018
FE8130 3.7 AUTUMN 2018
TFE4168 3.7 AUTUMN 2019
More on the course



Version: 1
Credits:  7.5 SP
Study level: Second degree level


Term no.: 1
Teaching semester:  SPRING 2025

Language of instruction: English

Location: Trondheim

Subject area(s)
  • Electronics
  • Electronics and Telecommunications
  • Materials Technology and Electrochemistry
  • Materials Science and Solid State Physics
  • Solid State Physics
  • Physical Electronics
  • Technological subjects
Contact information
Course coordinator: Lecturer(s):

Department with academic responsibility
Department of Electronic Systems


Examination arrangement: School exam

Term Status code Evaluation Weighting Examination aids Date Time Examination system Room *
Spring ORD School exam 100/100 C INSPERA
Room Building Number of candidates
Summer UTS School exam 100/100 C INSPERA
Room Building Number of candidates
  • * The location (room) for a written examination is published 3 days before examination date. If more than one room is listed, you will find your room at Studentweb.

For more information regarding registration for examination and examination procedures, see "Innsida - Exams"

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