course-details-portlet

TFE4167

Micro- and nanofabrication

Assessments and mandatory activities may be changed until September 20th.

Credits 7.5
Level Second degree level
Course start Spring 2026
Duration 1 semester
Language of instruction English
Location Trondheim
Examination arrangement School exam

About

About the course

Course content

This course provides an introduction to micro- and nanofabrication, including silicon technology for fabrication of sensors and actuators. Selected semiconductor manufacturing processes in clean room, such as photolithography, etch and metallization are highlighted. Basic mechanics for design of microelectromechanical systems (MEMS) is presented, together with different principles for sensors and actuators based on piezoresistivity, electrostatics, capacitance and thermal effects. Design and fabrication of different physical sensors, such as pressure sensors and accelerometers, are given in detail.

Learning outcome

Knowledge: The candidate has: - detailed knowledge on selected topics within fabrication technology for semiconductor devices and integrated circuits, as well as the different fabrication processes for manufacturing of MEMS - knowledge on the basic properties and applications of microsystem technology - knowledge on the general characteristics of sensors and actuators - detailed knowledge on the functional principles and structure of various types of micro-electro-mechanical sensors and actuators - knowledge on the key aspects, trade-offs and basic principles of design and optimization of MEMS. Technical skills: The candidate can: - do photolithography and simple processing of semiconductors in clean room, and do characterization with selected techniques - propose suitable sensor or actuation principles to achieve a particular function - select the optimal sensor or actuator design - carry out simple calculations of electro-mechanical properties of micro-electro-mechanical components - propose a suitable process for the fabrication of specific micro-electro-mechanical components. General expertise: The candidate has: - the required knowledge for more advanced studies on the fabrication technology and principles of operation of advanced semiconductor devices, electronic circuits and systems. - the required knowledge to discuss micro system technology in the context of important trends within information technology.

Learning methods and activities

Auditorium lectures and exercises (problems), and laboratory excercises in clean room and characterization lab.

Compulsory assignments

  • Exercises
  • Lab exercises

Further on evaluation

The written exam will be given in English only. If there is a re-sit examination in August, the examination form may be changed from written to oral.

Course materials

To be announced at course start.

Credit reductions

Course code Reduction From
TFE4180 3.7 sp Autumn 2018
TFE4177 3.7 sp Autumn 2018
TFE4225 3.7 sp Autumn 2018
TFE4162 3.7 sp Autumn 2018
FE8130 3.7 sp Autumn 2018
TFE4168 3.7 sp Autumn 2019
This course has academic overlap with the courses in the table above. If you take overlapping courses, you will receive a credit reduction in the course where you have the lowest grade. If the grades are the same, the reduction will be applied to the course completed most recently.

Subject areas

  • Electronics
  • Electronics and Telecommunications
  • Materials Technology and Electrochemistry
  • Materials Science and Solid State Physics
  • Solid State Physics
  • Physical Electronics
  • Technological subjects

Contact information

Course coordinator

Lecturers

Department with academic responsibility

Department of Electronic Systems

Examination

Examination

Examination arrangement: School exam
Grade: Letter grades

Ordinary examination - Spring 2026

School exam
Weighting 100/100 Examination aids Code C Duration 4 hours Exam system Inspera Assessment Place and room Not specified yet.

Re-sit examination - Summer 2026

School exam
Weighting 100/100 Examination aids Code C Duration 4 hours Exam system Inspera Assessment Place and room Not specified yet.