Course - Physical Methods for Nanostructuring and Characterization, Specialization Course - TFE4575
TFE4575 - Physical Methods for Nanostructuring and Characterization, Specialization Course
Examination arrangement: Work
|Evaluation form||Weighting||Duration||Examination aids||Grade deviation|
The course contains module courses at NTNU NanoLab within a selection of the following topics/techniques: Health environment and security at NTNU NanoLab, Lithography, SEM basic course, Thin film deposition and characterization, PECVD and dry etch, E-beam lithography, Postprocessing - scribing/sawing and bonding.
This course shall provide the theoretical and practical basis for being able to work in a cleanroom in general, as well as provide the theoretical, and to some degree the practical, basis for understanding a selection of state-of-the-art experimental techniques for nanostructuring and characterization with emphasis on physical methods.
After completion of this course, the students should be able to on their own use a selection of state-of-the-art experimental techniques for nanostructuring and characterization with emphasis on physical methods. The selected methods should be relevant for the Specialization project and Master thesis within Nanotechnology/Nanoelectronics.
Learning methods and activities
Training will be given as separate modules given by NTNU NanoLab and faculty associated with NTNU NanoLab. Each module will contain a theoretical and a practical session. The main focus will be on the practical training since the goal of this course is to teach the students to use selected state-of-the art equipment and experimental techniques. For most of the experimental techniques listed above, there will be given a theoretical lecture. In some instances it might be more practical for students to read the background information on their own. In addition to the lecture, there will be a practical session in the lab where equipment and techniques will be demonstrated. For selected techniques a practical test will be required. The students must pass the practical test in order to be permitted to use the technique on their own. The teaching methods and activities within the elective modules may be given as lectures, colloquia, laboratory courses or self studies, written reports and oral presentations. Teaching will be in English if students on international master programmes are attending the course. Due to the fact that all the laboratory activities and most of the lectures in the course are mandatory, it will be necessary for the students to participate in the teaching activities from the first week of lectures. Even though the formal sign-up date for the course is the same as for all other courses, it will not be possible to pass the course if one has not participated from the first week of lectures. All students are also encouraged to sign up prior to the start of the semester since that will greatly ease the work of organizing the lab groups.
Further on evaluation
Requirements for passing the course will be announced at the start of the semester.
As an example, all practical lab assignments and report assignments must be carried out satisfactorily (including own preparations for the lab assignments).
Recommended previous knowledge
TFE4146 Semiconductor Devices, TFY4220 Solid State Physics or similiar. The course is a part of the curriculum for the MTELSYS study program with specialization Nanoelectronics and photonics, as well as for the MTNANO study program. Students enrolled in other study programs may also be admitted to the course in cases where these students will need access to NTNU NanoLab for their Specialization project or Master thesis.
Required previous knowledge
TFE4177 Semiconductor Technology or similar.
To be announced at the start of the semester.
Credits: 7.5 SP
Study level: Second degree level
Term no.: 1
Teaching semester: AUTUMN 2020
No.of specialization hours: 12
Language of instruction: English, Norwegian
- Technological subjects
Examination arrangement: Work
- Term Status code Evaluation form Weighting Examination aids Date Time Digital exam Room *
- Autumn ORD work 100/100
Room Building Number of candidates