characterisation - cleanroom - NanoLab
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Area for Characterization
Area for Characterization
The area for characterization provides advanced microscopy and work stations for sample preparation. The cleanroom classification ranges from ISO7 to ISO5 depending on the instruments' requirements.
The area is equipped for the following activities:
- High resolution S(T)EM for imaging and material analysis (EDS)
- Focused ion beam (Dual beam FIB) for micro structuring, TEM-sample preparation and 3D reconstruction of materials, including material analysis (EDAX) and micromanipulators
- SEM (low vacuum) for fast and simple imaging and material analysis (EDS)
- Surface characterization with profilometer
- AFM in air, inert gas or liquid, at different temperatures. Mechanical probing.
- Sample preparation for electron microscopy (metal/carbon coating, UV/ozone cleaning)
Equipment:
- Scanning electron microscope combined with a focused ion beam (Dual beam FIB)
- Scanning electron microscope for high resolution imaging, including S(T)EM option
- Table top scanning electron microscope for fast, low resolution imaging
- Research AFM and student AFM
- Optical microscopes
- Profilometer
- Student STM
- Sputter coaters, plasma cleaner and UV/ozone cleaner
Ida&FIB

Cleanroom information
Cleanroom information
- Access to NTNU NanoLab
- Equipment and processes
(NorFab web page) - Courses
- Current Prices (PDF)
- Support (NorFab web page)