NTNU NanoLab

NTNU NanoLab

Research in the NTNU NanoLab

About NTNU NanoLab

 

NTNU NanoLab is one of 4 cleanrooms within "The Norwegian Micro- and Nanofabrication Facility", NorFab. The facility is open for students and scientists at NTNU, as well as external researchers.

The infrastructure is run by a staff of 9 engineers and operated according to hands-on principles. NTNU NanoLab has 700 m2 cleanroom facilities with cleanliness ranging from ISO7 to ISO5 and vibration reduced zones at VCF-level. The cleanroom is also built according to GMO laboratory class 2 requirements. 

 

 

Dedicated lab areas for

Dedicated lab areas for

Cleanroom area for chemical methods


This area is designed for synthesis and characterization of surfaces and particles. It holds cleanroom class ISO 7 (10 000) and is equipped for the following processes:

Nanosynthesis of films and particles:

  • Wet chemical methods (dip / spin coaters, microwave oven, Langmuir-Blodgett through)
  • Hydrothermal synthesis (high temperature ovens, autoclaves)

Nanoparticle / structure separation (sentrifuges, ultrasonic disintegraters)

Nanoscale characterisation:

  • AFM (Atomic Force Microscope ) in liquid or air
  • SECM (Scanning Electrochemical Microscope)
  • PSA (Particle size analysis)
  • Nanosight

Additional facilities:

  • Personal work places (benches, hoods, LAF benches)
  • Access to glove boxes (N2, Ar) and Schlenk lines
  • General laboratory equipment
  • Chemicals: Standard bulk chemicals and consumables are offered. Specialized chemicals / consumables must be covered by the user.

 

Cleanroom area for synthesis and structuring by physical methods


This area is equipped for thin film growth, micro- and nanolithographic methods and various etching processes. The area holds cleanroom class ISO6 (1000) to ISO 5 (100).

The area is equipped for the following types of activities:

  • UV lithography
  • Electronbeam lithography (EBL)
  • Nanoimprinting Metal deposition by thermal evaporation and  and sputtering
  • Deposition of dielectrics, oxides, nitrides and magnetic material
  • Wet etching
  • Dry etching (CAIBE, ICP-RIE)
     

Specialized equipment:

  • Maskaligners for photolithography and nanoimprinting
  • EBL for high resolution electron beam lithography over large areas
  • Plasma etchers for chlorine and fluorine based etching (ICP-RIE)
  • PECVD (Plasma enhanced chemical vapour deposition)
  • Thermal CVD (Chemical vapor deposition for graphene production)
  • Equipment  for HF-etching
  • CAIBE (ion beam etcher) for etching any material
  • Electron beam evaporators
  • Sputter coater

 

Area for Bionanotechnology


This cleanroom area is dedicated to bionanotechnology and is equipped for nanoscale synthesis, manipulation and characterisation of biological molecules and processes. There are two darkrooms available for microscopy work. The area is classified as ISO7 (10 000) and is prepared for GMO laboratory class 2. This permits work with gene modified organisms which are potentially harmful for humans, animals or plants. Projects in this category will require specific classification.

The area is equipped for the following activities:

  • Fabrication of nanostructured biopolymer surfaces through soft lithography and nanoimprinting.
  • Fabrication and use of microfluidic devices.
  • Use of microorganisms and cells within bionanotechnology.
  • Functionalisation of organic and inorganic nanoparticles with biological molecules.

Equipment:

  • Nanoimprinting and microcontact printing (soft lithography)
  • Designated area for work with silanes and siloxanes (PDMS)
  • Safety bench with laminar flow for extra cleanliness and safety when working with biological materials
  • Fluorescense microscope
  • Syringe pumps

The laboratory also has supporting equipment, such as spin coaters, centrifuges, ultra centrifuges, and standard laboratory equipment.
 

Area for Characterization


The area for characterization provides advanced microscopy and work stations for sample preparation. The cleanroom classification ranges from ISO7 to ISO5 depending on the instruments' requirements.

The area is equipped for the following activities:

  • High resolution S(T)EM for imaging and material analysis (EDS)
  • Focused ion beam (Dual beam FIB) for micro structuring, TEM-sample preparation and 3D reconstruction of materials, including material analysis (EDAX) and micromanipulators
  • SEM (low vacuum) for fast and simple imaging and material analysis (EDS)
  • Surface characterization with profilometer
  • AFM in air, inert gas or liquid, at different temperatures. Mechanical probing.
  • Sample preparation for electron microscopy (metal/carbon coating, UV/ozone cleaning)

Equipment:

  • Scanning electron microscope combined with a focused ion beam (Dual beam FIB)
  • Scanning electron microscope for high resolution imaging, including S(T)EM option
  • Table top scanning electron microscope for fast, low resolution imaging
  • Research AFM and student AFM
  • Optical microscopes
  • Profilometer
  • Student STM
  • Sputter coaters, plasma cleaner and UV/ozone cleaner

 

Area for Education


This area is classified as class ISO7 (10 000) and is dedicated to low resolution photolithography. It is used by both students and researchers.

The area is equipped for the following activities:

  • Education in general photolithography.
  • Experimental methods which are not approved for the cleaner photolithography area in the cleanroom.

Equipment:

  • Full photolithography line including maskaligner, spincoater, hotplate, oven, reflectometer and a yellow light microscope.
  • A chemical bench dedicated to work with acid/bases (water as solvent), including spinner and hotplate.
  • A chemical bench dedicated to work with solvents, including spinner and hotplate.

 

Our partners and networks

Our partners and networks

NorFab logo

NorFab logo

 

NTNU NanoLab leads the national infrastructure NorFab

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Nordic Nanolab Network logo

Nordic nanolab network logo

NTNU NanoLab is part of the Nordic Nanolab Network

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Nano network logo

 

NTNU NanoLab is part of the European Nanolab Network.